Vacuum UV / EUV and In Vacuum camera systems

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  • 4+ transistors with built in ADC
  • CDS allowing 3 electrons read out noise
  • 1024 x 1024 resolution with 15m pixel
  • Full well capacity > 40,000 electrons

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EUV and VUV cameras provide high resolution, high dynamic range as well as good temporal resolution.EUV and VUV cameras provide high resolution (typically down to less than 10 microns), high dynamic range (12 to 16 bit) as well as good temporal resolution (down to microsecond range) that are necessary for modern pulsed plasma discharge EUV sources. The camera can acquire single shot or synchronized multiple shot images at up to 13fps at full resolution from a native EUV source without suffering from bleeding artifacts. Flanged and/or in vacuum versions are available depending on the flexibility required for either mask blank / resist / source / optic characterization and inspection. Sensitivity response can be extended from 13.5nm up to 0,0135nm should the camera be used to sense multiple characteristic lines. Deep cooling allows very low dark current down to less than 0.005 electron/pixel/sec for extended exposure should very faint signal requires long integration periods.


  • EUV resin characterization
  • Soft X-ray astronomy
  • XUV plasma diagnostic
  • EUV mirror / grating calibration
  • Spectroscopy
  • Forensics
  • Pinhole imaging of Z-pinch soft X-ray source
  • Soft x-ray microscopy
  • 2 dimensional elemental mapping
  • Coherent soft X-ray imaging
  • EUV lithography


Additional Features:

  • 13,000:1 dynamic range unbinned
  • High Dynamic Range mode > 100,000:1 with overflow read out
  • 90% Quantum Efficiency with BSI
  • 1KHz frame rate
  • Input pixel size: 13 x 13microns
  • 19mm diagonal
  • 5 fps at full resolution @ 2x3 MHz
  • Read out noise: 25 electrons @ 2x3 MHz
  • C-mount
  • Made in UK

Read Abstract;

Abstract Investigations of plasma jets produced by the action of a defocused laser beam on planar metallic targets and the interaction of supersonic plasma jets with dense gases (He and Ar) are presented. The experiment was carried out at the iodine laser facility (Prague Asterix Laser System (PALS)) using the third harmonic of laser radiation (0.438 μm) with a pulse duration of 250 ps (FWHM). In order to optimize the plasma jet parameters, the laser beam energy and the focal spot radius were changed in the ranges of 13–160 J and 35–600 μm, respectively. Besides, the focal point was located both before and inside the targets. The study was performed with the use of target materials of different mass densities (Cu, Ag and Ta). Finally, the optimized Cu plasma jets were used for shock wave generation in ambient gases of different pressures. Information about the geometry of plasma expansion, plasma dynamics and electron density distributions was obtained by means of a 3-frame laser interferometric system. Additionally, a Photonic Science PE7051 x-ray pinhole camera and the crater replica method for the reconstruction of crater parameters were used. 


  • 1024 (h) x 1024 (v) CCD array
  • Input Pixel size: 13 x 13 microns
  • 19mm diagonal
  • 5fps at full resolution @2x3 MHz
  • Read out noise: 25 electrons @ 2x3 MHz
  • Full well capacity: 100,000 electrons in binning 1x1
  • Dark current: <1 electron / pixel / second
  • 14-bit digitisation
  • Camera Link / GigE nterface
  • Synchronisation / control: via TTL pulse or pixel clock

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